Afterschool
July 10, 2018
2017 SPM candidates are invited to apply for a sponsorship under the B40 Bursary Programme (JPA Dermasiswa B40). The programme targets students pursuing diploma-level and professional certificates in institutions identified from the background of low-income families, the B40s will receive aid in terms of scholarship.
The objective of the programme is to help students from low income families to pursue higher education, especially in the field of TVET and professional certificates with high prospects for the industry.
For the year 2018, sponsorships involved are in courses offered by Public Universities, Politeknik, Institut Kemahiran Awam, UniKL Malaysia Institute of Aviation Technology (MIAT), UniKL Malaysia Institute of Marine Engineering Technology (MIMET) and Kolej Universiti Poly-Tech MARA (KUPTM).
Requirements
Interested applicants must fulfill the general and specific entry requirements below:
General Requirements
Specific Requirements
i. For Public Universities / Politeknik / UniKL MIMET / UniKL MIAT / KUPTM / UNITEN / MMU
ii. For Institut Kemahiran Awam (National Youth Skills Institute (IKTBN) / MARA Skills Institute / MARA High Skills College / Community College / High Technology Training Center (ADTEC) / Japan-Malaysia Technical Institute (JMTI))
Courses Not Offered
Courses not covered by this sponsorship includes education, nursing, courses that require students to take piloting license and professional courses such as ACCA, LINUX and CLP.
How to Apply
Applications are now OPEN online at eSILA Portal http://esilav2.jpa.gov.my for 16 days from July 10, 2017 (Tuesday) from 5.00pm, to 16 July 2017 (Wednesday) at 5.00pm.
Questions about the sponsorship programme and problems regarding technical issues can be made by calling 03-8885 3049 on every working day from 9:00am to 4:30pm or through their online portal here.
Results
Results are estimated to be released on August 30, 2018 (Thursday) at 5.00pm through this portal.
Click here to apply now
© 2025 Afterschool. All Rights Reserved.